[labnetwork] Low temperature PECVD / ICP-CVD / Remote PECVD

[Massey, Travis]

Hi Philippe,

My users have not been successful in depositing waveguide-quality nitride at low temperatures.  We're currently fixing some issues with our tool to increase the temperature.  That said, we are also still working through a slew of manufacturing defects on our PlasmaTherm Takachi HDPCVD system that have almost certainly been impacting film quality.  The promise of HDPCVD/ICPCVD (same thing, PlasmaTherm's term versus Oxford's term) is that good low-temperature films should be possible, but we've not seen this yet.  For what it's worth, Oxford also failed to meet expectations when I requested a trial film.

Are temperatures below 100 C strictly required for your application?

Best,
Travis Massey
Center for Micro and Nano Technology (CMNT)
Lawrence Livermore National Laboratory

From: labnetwork <labnetwork-bounces at mtl.mit.edu> On Behalf Of Philippe Mérel
Sent: Friday, January 17, 2025 12:52 PM
To: labnetwork at mtl.mit.edu
Subject: [labnetwork] Low temperature PECVD / ICP-CVD / Remote PECVD

Can you share your experience if you are depositing silicon nitride and / or silicon oxide thin films at low substrate temperature (below 100C) by PECVD or ICP-CVD that have good optical qualities (for waveguide applications).


  1.  Which deposition system are you using?

  1.  What was the substrate temperature?
Thank you.


Philippe Mérel PhD

Coordonnateur Laboratoire Nanotechnologies et Nanosystèmes (LNN)

Institut Interdisciplinaire d'Innovation Technologique - 3iT

Université de Sherbrooke

(819) 821-8000 x63706

https://www.usherbrooke.ca/3it/<https://urldefense.us/v3/__https:/www.usherbrooke.ca/3it/__;!!G2kpM7uM-TzIFchu!wm_s02v-xmJIGmDgCyRb3yVy0IJFNbH2QErCbEhoKlVcZqgCZAVhl-f0u6XNmNcsjm3ZY6SFS8L8B28_L7Ok8efGRVTsCMA11w$>

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