[labnetwork] Low temperature PECVD / ICP-CVD / Remote PECVD

[Demis D. John]

Our AJA Sputter tool produced SiN waveguide cores back in 2012 that
achieved 3.0dB/m losses.  However those were annealed at 1050°C as well - I
never tried it without annealing though, could be low enough loss.

Also our Deuterated Silane ICP-PECVD tool produces good films at 100°C
(since it has high density plasma), but nobody has tried using anything but
the standard 250°C films for waveguides.  I suspect the 100°C films will
operate similarly.
Here two a papers on the standard films from this tool:
250°C process for un-annealed waveguides:
https://wiki.nanofab.ucsb.edu/wiki/Template:Publications#250C_Process_for_%3C_2dB/m_Ultra-Low_Loss_Silicon_Nitride_Integrated_Photonic_Waveguides

SiD4 waveguides paper:
https://wiki.nanofab.ucsb.edu/wiki/Template:Publications#Deuterated_silicon_dioxide_for_heterogeneous_integration_of_ultra-low-loss_waveguides

-- Demis (contact info <https://wiki.nanotech.ucsb.edu/wiki/Demis_D._John>)
*Reminder*: The NanoFab has a publications policy
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On Fri, Jan 17, 2025 at 16:43 Philippe Mérel <Philippe.Merel at usherbrooke.ca>
wrote:

> Can you share your experience if you are depositing silicon nitride and /
> or silicon oxide thin films at low substrate temperature (below 100C) by
> PECVD or ICP-CVD that have good optical qualities (for waveguide
> applications).
>
>
>    1. Which deposition system are you using?
>    2. What was the substrate temperature?
>
> Thank you.
>
> *Philippe Mérel PhD*
>
> Coordonnateur Laboratoire Nanotechnologies et Nanosystèmes (LNN)
>
> Institut Interdisciplinaire d’Innovation Technologique – 3iT
>
> *Université de Sherbrooke*
>
> (819) 821-8000 x63706
>
>
> https://www.usherbrooke.ca/3it/
>
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