[labnetwork] RTA annealing of PVD Silicon

[Andrei Alamariu]

Hello,
The surface roughness of the deposited Polysilicon film, it is determined by the intrinsic process conditions. It can not be be improved by high temperature treatments, on contrary, the amorphous film’s crystals size increases during high (> 670C I think) temperature anneal. 
Thanks, Andrei
Sent from my iPad

> On Jan 23, 2025, at 3:56 PM, Howard Northfield <Howard.Northfield at uottawa.ca> wrote:
> 
> 
> 
> Dear Labnetwork
> 
> Currently doing PVD deposition of undoped Silicon. Would like to improve the surface roughness and crystal quality of the PVD Silicon using rapid thermal annealing (RTA). Does anyone have experience in this and what RTA recipe you use.
> 
> Thank you
> 
> Howard Northfield
> Research Engineer
> Advanced Research Complex (ARC)
> University of Ottawa
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