[labnetwork] Question on hafnium etching and the post-etch chamber clean.

[Christopher Raum]

 Hi all,

I'm interested in etching roughly 100 nm of Hf on silicon. There's a
concern about the etch byproducts (mainly HfCl4) being difficult to remove
and therefore causing chamber contamination for subsequent users.

Does anyone out there have experience plasma etching Hf? If so

1) Can you confirm a Cl based etch is best? Any luck using a F based etch?
2) What is the post-etch chamber clean recipe that you use?

Thanks for your help!

-Chris
-- 
R&D Engineer 3
Experimental Cosmology Group
Radio Astronomy Lab
University of California, Berkeley
278 LeConte Hall
Berkeley, CA,
Email: craum at berkeley.edu
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