[labnetwork] Dry Plasma Etch Cleaning Recipes and Evaluation

[Martin, Michael]

Hi Emma,
    Our go to method on our DRIE tools is just a relatively high power O2 clean for like 30 min at a kW or 2.  Although I was talking to our Oxford technician and he says occasionally it's necessary to mechanically clean these reactors with scotchbright followed by O2 clean.

-Michael

________________________________
From: labnetwork <labnetwork-bounces at mtl.mit.edu> on behalf of Emma Anquillare <eanquillare at gc.cuny.edu>
Sent: Monday, March 17, 2025 6:59 PM
To: Labnetwork (labnetwork at mtl.mit.edu) <labnetwork at mtl.mit.edu>
Subject: [labnetwork] Dry Plasma Etch Cleaning Recipes and Evaluation


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Dear Labnetwork Hivemind,

I am looking to assemble what we know collectively about dry plasma etch cleaning recipes so that I can summarize, compare, and ultimately experimentally evaluate them.

I am interested in:
-Do your facility's etchers (ICP/ RIE) have custom clean recipes specific to certain etch recipes or materials? If so, what are they and what are both the recipe and clean parameters?
-Do you use an emission spectrometer (or any other method) to develop or evaluate these cleans?
-How did you come up with these cleans in the first place?
-Have you seen any good talks, literature, or other resources relevant to this subject?


Anything you can share is appreciated and (I hope) will be worth your efforts to provide, as I am seeking to compile this for public benefit.

Thanks!
Emma

_____________________________________________
Emma Anquillare, PhD
Research Scientist
ASRC Nanofabrication Facility
City University of New York

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