[labnetwork] Dry Plasma Etch Cleaning Recipes and Evaluation
Harris, David (Plasma-Therm LLC)
david.harris at plasmatherm.com
Thu Mar 20 08:49:20 EDT 2025
On the Plasma-Therm CORIAL Etch platform, especially as these systems are using a shuttle concept (2", 3", 4", 6", 8" to transfer the wafers or coupons, using a dedicated shuttle and set of liner/upper injection flange of the process chamber minimizes the time to switch between Fl and Cl processes (estimated 15min for hardware change and plasma clean).
David
From: labnetwork <labnetwork-bounces at mtl.mit.edu> On Behalf Of Martin, Michael
Sent: Wednesday, March 19, 2025 4:27 PM
To: Emma Anquillare <eanquillare at gc.cuny.edu>; Labnetwork (labnetwork at mtl.mit.edu) <labnetwork at mtl.mit.edu>
Subject: Re: [labnetwork] Dry Plasma Etch Cleaning Recipes and Evaluation
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Hi Emma,
Our go to method on our DRIE tools is just a relatively high power O2 clean for like 30 min at a kW or 2. Although I was talking to our Oxford technician and he says occasionally it's necessary to mechanically clean these reactors with scotchbright followed by O2 clean.
-Michael
________________________________
From: labnetwork <labnetwork-bounces at mtl.mit.edu<mailto:labnetwork-bounces at mtl.mit.edu>> on behalf of Emma Anquillare <eanquillare at gc.cuny.edu<mailto:eanquillare at gc.cuny.edu>>
Sent: Monday, March 17, 2025 6:59 PM
To: Labnetwork (labnetwork at mtl.mit.edu<mailto:labnetwork at mtl.mit.edu>) <labnetwork at mtl.mit.edu<mailto:labnetwork at mtl.mit.edu>>
Subject: [labnetwork] Dry Plasma Etch Cleaning Recipes and Evaluation
CAUTION: This email originated from outside of our organization. Do not click links, open attachments, or respond unless you recognize the sender's email address and know the contents are safe.
Dear Labnetwork Hivemind,
I am looking to assemble what we know collectively about dry plasma etch cleaning recipes so that I can summarize, compare, and ultimately experimentally evaluate them.
I am interested in:
-Do your facility's etchers (ICP/ RIE) have custom clean recipes specific to certain etch recipes or materials? If so, what are they and what are both the recipe and clean parameters?
-Do you use an emission spectrometer (or any other method) to develop or evaluate these cleans?
-How did you come up with these cleans in the first place?
-Have you seen any good talks, literature, or other resources relevant to this subject?
Anything you can share is appreciated and (I hope) will be worth your efforts to provide, as I am seeking to compile this for public benefit.
Thanks!
Emma
_____________________________________________
Emma Anquillare, PhD
Research Scientist
ASRC Nanofabrication Facility
City University of New York
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Catalyzing Change, Celebrating Gains:
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