[labnetwork] SnO2 at last!

[Martin, Michael]

Thank you to everyone that helped us out with developing the TDMASn+H2O process in our Beneq TFS200, especially Petr from Beneq service.  The attached photo shows our tin oxide at about 110 nm on silicon and silicon/Al2O3 (at the 10 o'clock position) with areas masked by strips of Kapton tape. The deposition was done at a precursor temperature of 55 to 60C, the substrate was 80-90C.
   Some of the subtleties with this process seems to be:

  1.
TDMASn decomposes if the temperature is above ~60C for extended periods.
  2.
TDMASn in a bubbler that has traces of precipitated Sn from a previous run will catalyze decomposition of a new batch. (we have not directly confirmed this though)
  3.
Even with the bubber at 55 to 57C the vapor pressure is pretty low necessitating one to load the headspace with carrier gas, hold and then inject.
  4.
A number of folks warned about having the down-stream tubing heated above the precursor temperature.  Fortunately Beneq had this covered so it was not an issue.

So should anyone need devices coated, please let us know.  We ARE a service center.

[cid:f06b814f-8593-4569-af78-3d7c6c926aca]


Regards,

   Michael Martin, Ph.D.


Engineering Senior Researcher

Micro/Nano Technology Center

University of Louisville


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