[labnetwork] Experience with BaTiO₃ etching in an ICP-RIE

[Jacob T. Trevino]

Hi All,

We are reaching out to see if anyone has experience etching barium titanate
(BaTiO₃, BTO) in a ICP-RIE system (our system is an Oxford PlasmaPro 100
Cobra).

One of our users has requested to etch BTO using a Cl₂/Ar plasma. Our
primary concern is the potential formation of nonvolatile barium chloride
(BaCl₂), which could deposit on chamber surfaces and pose a
cross-contamination risk for subsequent users. We're trying to understand
whether this is a manageable process or one that should be avoided in a
multi-user environment.

I'd be interested in hearing about your experience, including:

   - Have you processed BTO in a Cl₂/Ar ICP-RIE?
   - If so, did you observe persistent chamber contamination or evidence of
   cross-contamination?
   - Were standard chamber cleaning procedures sufficient to restore the
   tool?
   - Did you implement any special qualification, dedicated hardware, or
   process restrictions?
   - If you decided against running BTO in a shared chlorine etcher, what
   was your rationale?

Any insights, lessons learned, or references to published work would be
greatly appreciated.

Best,
Jacob

PS: So good to see many of you at UGIM!

-------------------------------------
*Jacob Trevino, PhD*
Senior Director, Columbia Nano Initiative Labs
Columbia University
530 W120th Street, Room 1015/MC 8903
New York, NY 10027
Email: jt2900 at columbia.edu
Cell: 734-787-2171
Desk: 212-854-9927
https://cni.columbia.edu/
https://www.linkedin.com/in/jacob-t-trevino/
-------------- next part --------------
An HTML attachment was scrubbed...
URL: <https://mtl.mit.edu/pipermail/labnetwork/attachments/20260804/75365a67/attachment.html>