[labnetwork] Photomask sticks to SU8

[Phillip Bauer]

Hello

I am somewhat new to SU-8 working with Positive resists throughout my career. I agree with data sheets are just guideline, for processing.  I saw a note from another University to run a 65 deg post bake after the 95 deg soft bake.  My question is about mask cleaning.  Is Sulfuric/Peroxide (Piranha ~ 60-90C) really needed.  I would think the PGMEA or PGMEA/Acetone followed by IPA would be an effective clean.  Just wanted to poll the audience.



Thank you,

Phillip Bauer

Principal Photolithography Process Engineer

4350 Innovation Drive
Farmers Branch, Texas 75244

phillip.bauer at formfactor.com<mailto:phillip.bauer at formfactor.com>

M: 682 521 0874

[cid:ba6e1129-dc4b-4129-aa93-5fd29d4f17fe]





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