[labnetwork] Borosilicate glass as substrate for LPCVD

[Kathy Anderson]

Hello Lab Network,

Do you deposit LPCVD amorphous silicon onto a borosilicate glass substrate?  Do you have concerns about Na or Al from the substrate being transferred at 525C to the furnace walls or boat or paddle to present a cross contamination issue?  Due to the boron content, I don't expect the wafers to slump at that temperature, but I wonder about the Hydrogen (resulting from silane pyrolysis) scavenging Oxygen from the wafer surface to cause the remaining bond energy for a dangling Na or Al to be low enough to be overcome by thermal energy.  Of course, this would be only at the beginning of deposition.

We have rules to prevent glass from being used as a substrate in our furnaces, but for LPCVD at 525C, and for borosilicate glass, would you make an exception?

Kathy Anderson
University of Utah Nanofab




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