[labnetwork] Sputter conditions for XPS samples?

Mark Hofheins mhofheins at unm.edu
Wed May 27 09:20:17 EDT 2026


Good Morning Mario,

We will flow 13sccms to 20sccms of Ar during our sputter.
Optimum vacuum pressure for us is 3 millitorr.
Power will depend on what type of material the target is made of and
How much deposition you require/per time.

Best regards,

Mark Hofheins



mhofheins at unm.edu<mailto:mhofheins at unm.edu>

Cell  505-259-9278

Office 505-272-7506



Micro Electronics Technician &

 Safety Coordinator MTTC

Manufacturing Engineering/

School of Engineering

Science and Technology park

University of New Mexico

800 Bradbury S.E.  Suit 169

Albuquerque, New Mexico

87106-4346


________________________________
From: labnetwork <labnetwork-bounces at mtl.mit.edu> on behalf of Beaudoin, Mario <beaudoin at physics.ubc.ca>
Sent: Tuesday, May 26, 2026 5:57 PM
To: 'labnetwork at mtl.mit.edu' <labnetwork at mtl.mit.edu>
Subject: [labnetwork] Sputter conditions for XPS samples?


  [EXTERNAL]

Dear Network,

We have inherited an old XPS machine.  The XPS part works fine and we know how to acquire data.  For analysis, we will certainly consult experts before publishing as we are aware of the potential pitfalls.

We also have an Argon source and sputter power supply and we would like to sputter our sample surfaces to remove surface contaminants.  The problem: we are neophytes at that part of the process besides operating the cylinder and leak valve.

My question: What are the typical Ar pressures and power settings generally used for sputtering?

Please respond privately or through the network.

Big THANK YOU.

Mario

--
[cid:part1.4KqEyWSO.9bKWPR4C at physics.ubc.ca]
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