[labnetwork] Sputter conditions for XPS samples?
Mark Hofheins
mhofheins at unm.edu
Wed May 27 09:20:17 EDT 2026
Good Morning Mario,
We will flow 13sccms to 20sccms of Ar during our sputter.
Optimum vacuum pressure for us is 3 millitorr.
Power will depend on what type of material the target is made of and
How much deposition you require/per time.
Best regards,
Mark Hofheins
mhofheins at unm.edu<mailto:mhofheins at unm.edu>
Cell 505-259-9278
Office 505-272-7506
Micro Electronics Technician &
Safety Coordinator MTTC
Manufacturing Engineering/
School of Engineering
Science and Technology park
University of New Mexico
800 Bradbury S.E. Suit 169
Albuquerque, New Mexico
87106-4346
________________________________
From: labnetwork <labnetwork-bounces at mtl.mit.edu> on behalf of Beaudoin, Mario <beaudoin at physics.ubc.ca>
Sent: Tuesday, May 26, 2026 5:57 PM
To: 'labnetwork at mtl.mit.edu' <labnetwork at mtl.mit.edu>
Subject: [labnetwork] Sputter conditions for XPS samples?
[EXTERNAL]
Dear Network,
We have inherited an old XPS machine. The XPS part works fine and we know how to acquire data. For analysis, we will certainly consult experts before publishing as we are aware of the potential pitfalls.
We also have an Argon source and sputter power supply and we would like to sputter our sample surfaces to remove surface contaminants. The problem: we are neophytes at that part of the process besides operating the cylinder and leak valve.
My question: What are the typical Ar pressures and power settings generally used for sputtering?
Please respond privately or through the network.
Big THANK YOU.
Mario
--
[cid:part1.4KqEyWSO.9bKWPR4C at physics.ubc.ca]
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