[labnetwork] MAEBL 2026 at UC Berkeley and Online

[Gerald Lopez, Ph.D.]

Dear Colleagues:

You are cordially invited to attend our 1*0th Meeting for Advanced Electron
Beam Lithography* (MAEBL), hosted this year by our friends at UC Berkeley,
in Berkeley, California, USA, *October 13–15, 2026*. Attendees have the
option to attend online as well. Visit maebl.org to learn more.

Call to Action:

   - Register for MAEBL 2026
   <https://www.eventbrite.com/e/the-10th-meeting-for-advanced-electron-beam-lithography-maebl-registration-1981601897619?aff=oddtdtcreator>
to
   attend in person or online.
   - Book Your Hotel Room by September 28th ($189/night)
   <https://reservations.hotelshattuckplaza.com/book/dates-of-stay?groupID=5367441>

   - View Program
   <https://drive.google.com/file/d/161Q8b35v4uNAUnSj-qZJ-FeLx32S9ZfN/preview>
   - Follow on LinkedIn: https://www.linkedin.com/company/maebl

This year's speakers and topics include:

   - Day 0 (half-day for those arriving early)
      - Tour: Marvell NanoLab at CITRIS (In-Person Only)
      - Panel: Comparison of Calendaring Systems, including FBS, iLabs,
      NEMO-CE, and MERCURY
         - Gerald Lopez, University of Pennsylvania
         - Justin Wirth, Purdue University
         - Guy DeRose, Caltech
         - Allison Dove, UC Berkeley
      - Day 1: Foundations Workshop
      - The Importance of the Process Window in Nanofabrication by Fabien
      Grisé, Penn State
      - Process Control for Electron Beam Lithography by Devin
      Brown, Georgia Tech
      - I Wanna Go Fast!  Can Gaussian Beam EBL Ever Be Considered *Fast*?
      by Bill Mitchell, UCSB
      - E-beam Patterning of Curved Structures in Diffractive Optic
      Applications by Weilun Chao, Lawrence Berkeley National Laboratory
      - Optimised Writing Strategies for Quantum Integrated Photonics by
      Daniel Peace, The University of Queensland
      - Lessons Learned Transferring Electron Beam Lithography Processes
      Across a 23‑Year Gap Between Tool Platforms by Andres Paniagua, Teledyne
      Scientific Company
      - Common Challenges Open Discussion led by Mason Risley of Sandia
      and Joseph Christodoulides of Navy Research
   - Day 2: Core Meeting
      - Fabricating an Ultra-Low Blaze Angle Diffraction Grating for a NASA
      Telescope with LLM-assisted Characterization by Fabien Grisé, Penn State
      - An Introduction to E-beam Direct Write Using High Order Substrate
      Mapping by Ivan Milosavljevic, HRL Laboratories
      - Design Considerations for Metal Assisted Chemically Etched Devices
      by Anne Sakdinawat, SLAC
      - Challenges and Recent Progress with High Energy Beam Sensitive
      (HEBS) Glass by Jenny Zhou, Lawrence Livermore National Laboratory
      - Improving Weak Marker Detection using Computer Vision Techniques by
      Bingcheng Suo, Stanford University
      - AutoSEM: Critical Dimension and Line Edge Roughness Metrology Using
      Automated Scanning Electron Microscopy by Will Gunn, The University of
      Queensland
      - Common Challenges Open Discussion led by Mark Mondol of MIT

Sincerely,
Gerald G. Lopez, Ph.D.
Co-Founder and Board Chair, MAEBL



+1-215-573-4041 <(215)%20573-4041>
lopezg at upenn.edu

Gerald G. Lopez, Ph.D.

Managing Director, Singh Center for Nanotechnology

3205 Walnut Street, Philadelphia, PA 19104 USA
Deliveries: 3231 Walnut Street, LRSM Building, Philadelphia, PA 19104

linkedin.com/in/geraldglopez/

www.nano.upenn.edu
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