[labnetwork] How do you manage your RTA systems?

[Owain Clark]

When we have "exotic" material requests for anneal (especially wafer diced pieces) that we think may outgas, users are instructed to place an upside down shallow quartz dish over them. The sample sees the same temperature as is measured from wafer backside, the tool uses a little more power than normal, but if the sample outgasses we only have to clean the dish and not the whole upper quartz chamber window.

Do make sure it is pure quartz though, and do not melt a pyrex beaker like one enterprising user who was in a hurry and could not locate the proper dish. Users of the dishes are advised of the extra thermal mass and potential burn risk when unloading, so far no issues.

Users who anneal doped samples (implant or diffused) are required to have a 10nm thermal SiO2 or 100nm PECVD SiO2 cap prior to process. So far this seem to capture any upward emission from heavy doping.

Apart from that any dust/debris is removed with an acetone/IPA wipe down, usually the metals tool. We keep a spare window for all chambers in case there is something we cannot remove, then send the dirty one off for professional wet cleaning or lapping if it is judged to be recoverable.

BR, Owain

From: labnetwork <labnetwork-bounces at mtl.mit.edu> On Behalf Of Philippe Mérel
Sent: 01 April 2025 13:59
To: labnetwork at mtl.mit.edu
Subject: [labnetwork] How do you manage your RTA systems?

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Hello LabNetwork,

We are a university cleanroom with all kinds of research projects. We often have to deal with visible residues, smears inside our RTA after work by users.

I would like to know the rules you implemented on the use of your RTA (allowed materials and so on).

Thank you.


Philippe Mérel PhD

Coordonnateur Laboratoire de Nanofabrication et de Nanocaractérisation (LNN)

Institut Interdisciplinaire d'Innovation Technologique - 3iT

Université de Sherbrooke

(819) 821-8000 x61941

https://www.usherbrooke.ca/3it/

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