[labnetwork] Photoresist and Ebeam Resist In Same Spinner?

[Grant Shao]

Hello Labnetwork,

I'm wondering if there's a chemical reason for having dedicated spinners to keep photoresist and ebeam resist separated. I think quite a few of the university nanofabs do this, but wondering what the rationale is. Is there some sort of chemical reaction that makes it more likely to contaminate or harder to clean up?

Thanks,
Grant

--
Grant Shao
Nanofabrication Operations Manager
Stanford Nano Shared Facilities<http://snsf.stanford.edu/>

shaog at stanford.edu<mailto:shaog at stanford.edu> | 650.441.9042
Spilker Building, Room 004
348 Via Pueblo
Stanford, CA 94305-4088
-------------- next part --------------
An HTML attachment was scrubbed...
URL: <https://mtl.mit.edu/pipermail/labnetwork/attachments/20250219/5a3624a1/attachment.html>