[labnetwork] NH3 for silicon nitride deposition in ICP-CVD systems

[Joseph Losby]

Hello,

For those of you that operate a ICP chemical vapor deposition system for silicon nitride, do you use NH3 as one of your process gases or is N2 sufficient?   My understanding is that the disassociation efficiency of N2 is much higher in ICP systems, so NH3 may not be necessary.

Cheers,
Joe



Joseph Losby, PhD

Manager, qLab Operations

joseph.losby at ucalgary.ca


[cid:f9192b33-9107-4363-ac9b-dca9a86ab527]<https://io.ucalgary.ca/quantum-city>

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