[labnetwork] Low temperature PECVD / ICP-CVD / Remote PECVD

[Philippe Mérel]

Can you share your experience if you are depositing silicon nitride and / or silicon oxide thin films at low substrate temperature (below 100C) by PECVD or ICP-CVD that have good optical qualities (for waveguide applications).


  1.
Which deposition system are you using?
  2.
What was the substrate temperature?

Thank you.


Philippe Mérel PhD

Coordonnateur Laboratoire Nanotechnologies et Nanosystèmes (LNN)

Institut Interdisciplinaire d’Innovation Technologique – 3iT

Université de Sherbrooke

(819) 821-8000 x63706

https://www.usherbrooke.ca/3it/

[cid:d97f9d9a-25a7-401e-b1f1-b146eec5f865]
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