[labnetwork] Photoresist Spray Coater & Spinner

[S. J. Ben Yoo]

Hi, Everyone,

Two questions for you.

(1) At UC Davis we are trying to acquire a tool that can spin coat and spray coat photoresist.    Do you have a good recommendation for a new tool or used one for less than 200k, preferably below 140k?
I received a quotation from EVG for a new tool EVG101.  We like what we saw on the spec sheet and descriptions but the price is a bit on the high side for us.  Looking for a used unit, I got a quote for an old unit that is not supported (and we need to purchase one that has manufacturers’ support and maintenance).
Any suggestion would be appreciated.

(2) We are also trying to setup a bilevel resist exposure capability for high resolution metal liftoff.  My group members have been using LOR under the photoresist to give an undercut under the photoresist during the development but it is not a well-controlled process.
At my former lab, Bellcore, two types of photoresist : g-line (436 nm) and i-line (365 nm).  After the I-line litho and development, using g-line flood exposure at angled spin exposure worked very well.
Anyone knows of a good g-line exposure system for bilevel liftoff?
We also use DUV ASML stepper, hence we could also try g-line (436 nm) and DUV (248 nm) bilevel liftoff.

Any suggestion would be appreciated.

Thanks,

-Ben



_______________________________________________________________________________

S. J. Ben Yoo
Joint Faculty LBL and UC Davis 
Distinguished Professor, Department of Electrical and Computer Engineering
Room 3110, Kemper Hall
Mail Code 1915
University of California
Davis, California 95616
Mobile: (510) 407-2457
Fax: (530) 752-8428
email: sbyoo at ucdavis.edu
home page: http://sierra.ece.ucdavis.edu
_______________________________________________________________________________ 

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